Thin Film Deposition Services for Manufacturing and Advanced R&D Applications


Sputtering is an effective micro-fabrication process for depositing optical films, diffusion barriers, seed or adhesion layers for multilayer architectures, and for creating embedded passive components such as resistors, thermistors, thermocouples, strain gauges, IR detectors, and implantable electrodes.

The MicroConnex thin film work center specializes in deposition of high-quality thin films for custom manufacturing and advanced R&D applications. Our thin film deposition services include DC, pulsed DC, and RF magnetron sputtering of metals, metal-oxides, and other semiconductors on Kurt J Lesker Physical Vapor Deposition (PVD) tools. These systems use standard 3 inch magnetron targets and can also be used to perform co-sputtering of alloys. Film thickness uniformity is improved by rotating the substrate continuously during deposition. The sputter tools are also fully automated, recipe controlled with complete process data logging capability. Films can be sputtered on substrates up to 6×6 inches square and to thicknesses of 3000 nm (3 μm). Films can be deposited as blanket layers or can be patterned via photolithography or laser-cut shadow masks.

Our thin film deposition services include the following capabilities:

Standard metal sputtering targets: Ag, Al, Au, Cu, Cr, CuNi, Ir, Ni, NiCr, Nb, Pd, Ta, Ti, TiW

Reactive sputtering on oxides and nitrides including: IrO2, TiOx, Al2O3, TiN, TiWOx, TiWN, NiMoFeOx, and Si3N4

Plasma etching (O2, CF4) and RF sputter etching (Ar) are used to clean and activate surfaces and enhance adhesion prior to sputter deposition. Our plasma etch tool is a Nordson March ModVIA. It is fully automated, recipe controlled with complete process data logging capability.

Managing thermal effects of temperature-sensitive substrates (e.g. thin polymers, ferroelectrics, and piezoelectric ceramics) is achieved by tailoring the process parameters used.

Refer to our Capabilities & Guidelines to review additional material options for thin film deposition services.


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